JustAnotherPerson
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If SMEE can deliver an 28nm single exposure DUV stepper 2020-2021 will be possible for China to do not only 7nm but also 5nm way before 2025. They are ready have the etching equipment, the ion implantation equipment, the photo resists and other tools for that.Maximum China can do domestically is 28nm at the moment, not counting SMIC. We still got to move into 14nm, then 12nm, 10nm before considering 7nm. I would say I don't see China reaching 7nm until 2030, given US sanction.
https://cntechpost.com/2020/06/05/f...achine-expected-to-be-delivered-in-2021-2022/
http://www.blog.baldengineering.com/2018/12/chinese-amec-5nm-plasma-etching-tools.html
https://cntechpost.com/2020/06/30/c...mplantation-machine-makes-major-breakthrough/
https://optocrypto.com/china-will-have-its-own-photoresist-material-for-7nm-process-technology/
Not having an EUV machine will be hard to get the same yields than fabs with EUV but will not be to much far off, remember that ASML EUV machine is 14nm single exposure and according to sources the SMEE machine will be 28 nm single exposure will require more step to reach 7nm but not that much as with an ASML 38nm.