China developed the world's first lithography machine that uses UV light sources to achieve 22nm res

[Adam WANG SHANGHAI MEGA]

China developed the world's first lithography machine that uses UV light sources to achieve 22nm resolution
Science and Technology Daily 2018-11-30 10:41:30
Science and Technology Daily reporter Gao Bo

On November 29, 2018, the National Key Scientific Research Equipment Development Project undertaken by the Institute of Optoelectronic Technology of the Chinese Academy of Sciences passed the acceptance test. This is the world's first lithography machine that uses a UV light source to achieve a resolution of 22 nm. .

Researchers at the Institute of Optoelectronics of the Chinese Academy of Sciences operate super-resolution lithography equipment (for picture: Chinese Academy of Sciences Technology Photography Alliance)

The lithography machine is equivalent to a projector, and the fine line pattern is projected on the photosensitive plate, and the light is a carving knife. But the level of fineness of the line has a limit - not less than half the wavelength of light. "The light is too fat, the door is too narrow, and the light can't pass." Yang Yong, a scientist involved in the research, told the Science and Technology Daily reporter.

A lithography machine using a deep ultraviolet light source is the mainstream, and its imaging resolution limit is 34 nm, and the resolution is further improved by using multiple exposure techniques and the like, which is expensive.

In 2003, Optoelectronics began to study a new method: metal and non-metal film bonding, there will be disordered electrons at the interface; light illuminates the metal film, causing these electrons to vibrate in an orderly manner, producing electromagnetic waves with much shorter wavelengths, which can be used Lithography.

As a result, the "wide knife" became a "narrow knife." The lithography machine developed by Optoelectronics has a maximum linewidth resolution of 22 nm, which is equivalent to 1/17 wavelength, under a 365 nm wavelength source.

The lithography machine is familiar because it is a central role in the integrated circuit manufacturing industry. At present, the cutting-edge integrated circuit lithography machine monopolized by ASML in the Netherlands has a processing limit of 7 nm. Photoelectric lithography has a resolution of 22 nm, but the positioning is different.

Optoelectronics' lithography machine specializes in processing a range of nano-functional devices, including large-diameter thin-film mirrors, superconducting nanowire single-photon detectors, Cherenkov radiation devices, biochemical sensor chips and super-surface imaging devices. Remote sensing imaging, biochemical trace measurement, and special surface materials are of great significance.

Researcher Hu Song, deputy chief designer of the project, introduced the research situation of super-resolution lithography equipment development project (for picture: Chinese Academy of Sciences Technology Photography Alliance)

"ASML's EUV lithography machine uses a 13.5 nm EUV source, which costs up to 30 million yuan and is also used under vacuum." Hu Song, deputy director of the project, "we use the 365 nm UV mercury lamp. As long as tens of thousands of yuan. Our machine price ranges from one million yuan to ten million yuan, and the processing capacity is between the deep ultraviolet and extreme ultraviolet levels, which makes many users overjoyed."

Optoelectronics has adopted high-resolution, large-area technical routes, and has mastered core patents such as super-resolution lithography lens, precision gap detection, nano-level positioning precision workpiece table, high aspect ratio etching and multiple graphic matching lithography processes. Control, international leader in the field of super-resolution imaging lithography.

 

[kankan326]

Bad news for ASML. No wonder ASML recently cancelled sales ban to China.

 

[JSCh]

New machine raises country's image in photolithography
By ZHANG YANGFEI/ZHANG ZHIHAO | China Daily | Updated: 2018-11-30 06:53

The Institute of Optics and Electronics under the Chinese Academy of Sciences announced on Thursday that it has developed its own photolithography machine. [Photo/IC]

"Make it small" has been the mantra that drives big developments in microelectronics, from transistors to processors. So much so that high-tech companies' competitiveness rests on the ability to reliably create components on the scale of nanometers, or one-billionth of a meter.

At the heart of microengineering lies photolithography, one of the key techniques used to create the circuitry patterns on semiconductor chips. This allows engineers to pack and replicate complicated circuits with millions of components into a very tiny space using light.

This technique is so advanced that only a handful of companies from Europe and Japan can produce the machine capable of such a feat. But recently, China entered the game.

The Institute of Optics and Electronics under the Chinese Academy of Sciences announced on Thursday that it has developed its own photolithography machine, thus overcoming one of the major engineering obstacles limiting China's development in chips, nanocomponents and optical instruments.

The new machine, which scientists began building in 2012, can etch circuitry patterns less than 22 nanometers using ultraviolet light. Combined with other techniques, it can be used in the future to create chips of around 10 nanometers.

"The machine is of great value in manufacturing general chips and other materials that require microengineering, including some integrated circuits," said Hu Song, deputy chief designer of the project.

The machine can also be used to make small components for applications such as sensors, detectors and biochips, Hu said.

It is already being used by several institutions including Sichuan University and the University of Electronic Science and Technology of China.

However, the new machine's production capability is still small, hence it is still limited to producing key components for research, Hu said.

In the coming years, the teamwill focus its efforts on increasing the machine's productivity to industrial scale. There are still substantial gaps in the microengineering sector between China and developed countries, but China is catching up fast, Hu said.

Companies capable of photolithography will have an overwhelming edge in producing microelectronics, he said. Chip manufacturing giant Intel claimed it could produce more than 5 billion nanoscale transistors every second, according to its company's fact sheet.

The world's largest photolithography supplier is a Dutch company called ASML Holding. Some of ASML's main competitors are Canon and Nikon.

Since the late 1990s, China has been blocked from importing cutting-edge photolithography technologies and other chip manufacturing equipment from developed countries.

This situation is aggravated because ASML owns substantial patents covering imprint lithography, which includes photolithography, Hu said.

As a result, Chinese companies have to rely on relatively outdated and inefficient techniques to produce microelectronics, thus their product is often inferior to that of developed countries.

To overcome the monopoly, the Institute of Optics and Electronics discovered a new physics phenomenon in 2003 and used the property as the basis for the new machine.

China now has 47 domestic and four international patents regarding the new technology, Hu said.

"We no longer fear a foreign technical blockade because we have full intellectual ownership of the new technique."

 

[antonius123]

First China-made 28nm lithography machine expected to be delivered in 2021-2022
2020-06-05 23:25:47 GMT+8 | cnTechPost

According to media reports, the Shanghai Micro Electronics Equipment (Group) Co. (SMEE) announced that, building on the previous 90nm the first China-made 28nm immersion type lithography machine will be delivered in 2021-2022.

Although it still has a big gap with the Dutch 7nm chip preparation process, it also marks a leap forward in China-made lithography, which is gradually reducing the gap with ASML.


The Chinese market accounts for one-third of global semiconductor sales, and there is an urgent need for semiconductor import substitution.

According to Guotai Junan Securities, the SMEE is the most technologically advanced lithography equipment in China manufacturer. At present, the company's IC front-end lithography machine level is significantly different from ASML, but it continues to achieve milestones and has already achieved production capacity of 90nm process.

The company has achieved entry into the market from the low-end, with a high domestic market share in the market segment.

The company has advanced package lithography technology and has become an important supplier to leading packaging and testing companies, with a domestic market share of 80% and a global market share of 40%.


The company LED/MEMS/power device lithography machine performance indicators leading, LED lithography machine market share first.

At present, the company has 4 series of lithography products, the 600 series of lithography machine, has been able to meet the 90nm chip production, can be used for 8-inch line or 12-inch line of large-scale industrial production.
The ASML is the world's only high-end lithography manufacturers, only about 20 units of high-end equipment per year, each one was TSMC and Samsung and other large chip foundries snapped up.

The company has recently launched a new semiconductor technology first-generation HMI multi-beam inspection machine, which can be used for 5nm and more advanced processes, is expected to make 5nm chip production capacity soared 600%.

https://cntechpost.com/2020/06/05/f...achine-expected-to-be-delivered-in-2021-2022/